Please wait
 
Karadjordjeva 33, Kragujevac
Choose language:
 

Atomic layer deposition system

Chemical vapor deposition systems

Conventional categories of vacuum deposition processes include chemical vapor deposition (Chemical Vapor Deposition CVD), physical vapor deposition (PVD Physical Vapor Deposition), evaporation in a vacuum sublimation, or occasionally, some combination of the aforementioned methods. These are just some modes of development of thin film.

As a representative of the global US company TORR International Inc., a specialist in the field of nanotechnology and thin film technologies, Kvark offers a variety of solutions, which can be seen below.

Chemical Vapour Deposition (CVD) is a chemical process used for the production of solid materials of high quality, high performance. In a typical process, a substrate is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit.

Within the CVD (Chemical vapor deposition) system, Kvark offers a variety of basic and upgradeable systems designed for specific needs of customers:
• Atomic layer deposition system
• CVD, PECVD, MOCVD systems

More on the manufacturer, you can find in the option REPRESENTATIONS AND PROJECTS, or on the website www.torr.com, and something more about division of the systems and their characteristics in brochure 2016 Torr International Inc-Corporate Brochure. download